Photolithography

M. Kido, Gabor Szabó, J.R. Cavallaro, W.L. Wilson, M.C. Smayling, and F.K. Tittel, "Submicron Optical Lithography Based on a New Interferometric Phase Shifting Technique," Jpn. J. Appl. Phys. 34, 4269-4273 (1995 ).

M. Erdélyi, Zs. Bor, F.K. Tittel, J.R. Cavallaro, G. Szabó, W.L. Wilson, and C. Sengupta, "Enhanced Microlithography Using Combined Phase Shifting and Off-Axis Illumination," Jap. J. Appl. Physics 34, L1629-L1631 (1 995).

F.K. Tittel, J.R. Cavallaro, M.C. Smayling, M. Erdélyi, G. Szabó, and Zs. Bor, "High Resolution Microlithography Applications of Deep-UV Excimer Lasers," XI International Conference on Gas Flow and Chemical Lasers and High Pow er Laser Conference, Edinburgh, Scotland (Aug. 25-30, 1996).

Miklos Erdelyi, Zsolt Bor, Gabor Szabo, Joseph R. Cavallaro, Michael C. Smayling, Frank K. Tittel and William L. Wilson: Sub-quarter micron contact hole fabrication using annular illumination, Optical Microlithography IX, Santa Clara, CA (March 10-13, 1996); SPIE Proc. 2726, 88-93 (1996)  

M. Erdélyi, Z.L. Horváth, Zs. Bor, G. Szabó, J.R.Cavallaro, M.C. Smayling, and F.K. Tittel, "Optical Microlithography with Nearly Nondiffracting Beams," Optical Microlithography XI, Santa Clara, CA (March 9-14, 1997 ).

M. Erdelyi, Z. L. Horvath, G. Szabo, Zs. Bor, F. K. Tittel, Joseph R. Cavallaro, Michael C. Smayling: Generation of Diffraction-Free Beams for Applications in Optical Microlithography, J. Vac. Sci. Technol. B 15(2) Mar/Apr 287-292 (1997).  

Z.L. Horváth, M. Erdélyi, G. Szabó, Zs. Bor, F.K. Tittel, and J.R. Cavallaro, "Generation of Nondiffracting Bessel Beams with Fabry-Perot Interferometer," JOSA A 14, 3009-3013 (1997).

J.R. Cavallaro, C. Sengupta, W.L. Wilson, and F.K. Tittel, "Automated Evaluation of Critical Features in VLSI Layouts Based on a Photolithographic Simulation", IEEE Trans. on Semiconductor Manufacturing 10, 482-494 (1997).

Z. L. Horváth, M. Erdélyi, G. Szabó, Zs. Bor, F. K. Tittel, and J. R. Cavallaro: Generation of zero order Bessel beams with Fabry-Perot interferometer, International Conference on New Laser Technologies and Applications (Paolo Di Lazzaro Greece 1997) SPIE Proc. Vol.: 3423 pp.: 135-139

F. K. Tittel, M. Erdélyi, Z. L. Horváth, A. Kroyan, W. William, M. Smayling, Zs. Bor and G. Szabó, Present and future trends in excimer-laser-based microlithography, Proc. SPIE Vol. 3403, p. 248-253 (1998), International Conference on Atomic and Molecular Pulsed Lasers II, Ed.: Victor F. Tarasenko; Georgy V. Mayer; Gueorgii G. Petrash.

Armen Kroyan, Marc D. Levenson, and Frank K. Tittel, "Coping with the Impact of Lens Aberrations in the Context of Wavefront Engineering," Optical Microlithography XI, Santa Clara, CA (Feb. 22-27 1998), SPIE Conf. Proc. 3334, 832-838 (1998).

Miklos Erdelyi, Zsolt Bor, Gabor Szabo, and Frank K. Tittel, "Enhanced Microlithography using Coated Objectives and Image Duplication," Optical Microlithography XI, Santa Clara, CA (Feb. 22-27 1998) SPIE Conf. Proc. 3334, 579-589 (1998).

A. Kroyan, G.P. Watson, R.A. Cirelli, O. Nalamasu, A.E. Novembre, and F.K. Tittel, "Sub- Resolution Assist Feature Tolerances for Contact Windows Using 193 nm Lithography," 18th Bacus Symposium; Redwood City, CA (Sept. 16-18, 1998).

Miklos Erdelyi, Zs. Bor, William L. Wilson, Michael C. Smayling and Frank K. Tittel: Simulation of Coherent Multiple Imaging by means of Pupil Plane Filtering in Optical Microlithography, J. Opt. Soc. Am. A 16(8), pp.: 1909-1914 (1999)  

Miklos Erdelyi, Karoly Osvay, Zsolt Bor, William L. Wilson, Mike C. Smayling, and Frank K. Tittel, "Coherent Multiple Imaging by Means of Pupil Plane Filtering," Optical Microlithography XII, Santa Clara, CA (March 14-19, 1999).

M. Erdelyi, A Kroyan, K. Osvay, Zs. Bor, W. L. Wilson, M. C. Smayling and F. K. Tittel: Coherent Multiple Imaging by means of Pupil Plane Filter, Optical Microlithography XII, Santa Clara, CA (February 17-19, 1999); SPIE Proc. 3679 pp.: 762-771 (1999)

M. Erdelyi, K. Osvay, Zs. Bor, W. L. Wilson, M. C. Smayling and F. K. Tittel: Enhanced Microlithography using Coherent Multiple Imaging, The International Symposium on Microelectronics Manufacturing Technologies (Lithography for Semiconductor Manufacturing) Edinburgh, UK (19-21 May, 1999); Eds. Chris A. Mack and Tom Stevenson, EUROPTO Series MMT01, SPIE Proc. 3741 pp.: 180-188, (1999)  

Miklos Erdelyi, Zsolt Bor, William L. Wilson, Michael C. Smayling, and Frank K. Tittel: "Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique", Applied Optics 39, 1121-1129 (2000)

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