Dr. Badgwell

Research Interests:

• Process Modeling
• Process Optimization
• Process Control

Education:

• B.S. (1982) Rice University
• M.S. (1990) University of Texas at Austin
• Ph.D. (1992) University of Texas at Austin

State-of-the-art control systems optimize plant behavior through the use of a process model, derived either from plant tests or from physical conservation laws. Control system performance is closely related to model accuracy, sometimes leading to unstable closed-loop behavior if the model is especially poor. My research is focused on development of control algorithms that are less sensitive to model accuracy; this is accomplished by incorporating knowledge of model uncertainty directly into the problem formulation. This can be done through the use of cost function constraints that prevent unstable behavior for a range of possible plant dynamics.

Publications

1. Ralhan, S., and T.A. Badgwell, "Robust Model Predictive Control for Integrating Linear Systems with Bounded Parameters," Ind. Eng. Chem. Res., 39/8, 2981-2991, (2000).
2. Ralhan, S., and T.A. Badgwell, "Robust Control of Stable Linear Systems with Continuous Uncertainty," Comp. Chem. Eng., 24/11, 2533-2544, (2000).
3. Kassmann, D.E., T.A. Badgwell, and Robert B. Hawkins, "A Robust Steady-State Target Calculation for Model Predictive Control," AIChE J., 46/5, 1007-1024, (2000).
4. Joe, R., Badgwell, T.A., and R.H. Hauge, "Atomic Carbon Insertion as a Low-Substrate-Temperature Growth Mechanism in Diamond CVD," Diamond and Related Materials, 7, 1364-1374 (1998).
5. Meadows, E.S., and T.A. Badgwell, "Feedback Through Steady-State Target Optimization for Nonlinear Model Predictive Control," Journal of Vibration and Control, 4/1, 61-74, (1998).
6. T.A. Badgwell, "Robust Stability Conditions for SISO Model Predictive Control Algorithms," Automatica, 33/7, 1357-1361, (1997).
7. T.A. Badgwell, "Robust Model Predictive Control of Stable Linear Systems," Int. J. Control, 68/4, 797-818, (1997).
8. Kassmann, D.E., and T.A. Badgwell, "Analysis of Process Modifications for Efficient Diamond Chemical Vapor Deposition," Diamond and Related Materials, 5/9, 895-906, (1996).
9. Kassmann, D.E., and T.A. Badgwell, "Modeling Diamond Chemical Vapor Deposition in a Rotating Disk Reactor," Diamond and Related Materials, 5/3-5, 221-225, (1996).
10. Badgwell, T.A., Breedijk T., Bushman, S.G., Butler, S.W., Chatterjee, S., Edgar, T.F., Toprac, A.J., and I. Trachtenberg, "Modeling and Control of Microelectronics Materials Processing," Computers and Chemical Engineering, 19, 1-41, (1995).
11. Badgwell, T.A., Edgar, T.F., and I. Trachtenberg, "Modeling the Wafer Temperature Profile in a Multiwafer LPCVD Furnace," Journal of The Electrochemical Society, 141, 161, (1994).
12. Badgwell, T.A., Edgar, T.F., Trachtenberg, I., Yetter, G., Elliott, J.K., and R.L. Anderson, "In-situ Measurement of Wafer Temperatures in a Low Pressure Chemical Vapor Deposition Furnace," IEEE Transactions on Semiconductor Manufacturing, 6, 65, (1993).
13. Badgwell, T.A., Edgar, T.F., and I. Trachtenberg, "Modeling and Scale-up of Multiwafer LPCVD Reactors," AIChE Journal, 38, 926, (1992).
14. Badgwell, T.A., Edgar, T.F., Trachtenberg, I., and J.K. Elliott, "Experimental Verification of a Fundamental Model for Multiwafer Low Pressure Chemical Vapor Deposition of Polysilicon," Journal of The Electrochemical Society, 139, 524, (1992).

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