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Seminars
Block Copolymer Lithography
Paul Nealey
Department of Chemical & Biological Engineering
University of Wisconsin-Madison
When: Thursday, October 13, 2005
Time: 2:30 PM to 3:30 PM
Where: 1064 Duncall Hall
Abstract:
Whereas in the past decade significant resources have been allocated to the development of exposure tools capable of resolving patterns with dimensions of 30 nm or less and with the required registration and overlay capabilities, relatively modest investments have been made in the development of imaging materials with the required properties at this length scale. One of the current challenges in nanolithography is the integration of self-assembling materials into existing manufacturing strategies so as to achieve molecular-level process control and the ability to produce useful architectures. Recently we demonstrated that the domains of block copolymer films could be directed to assemble perfectly over arbitrarily large areas and in registry with lithographically defined periodic chemical surface patterns, and the self-assembling nature of block copolymer resist materials self-corrects for anticipated types of dimension control issues. We also demonstrate that by directing the assembly of blends of block copolymers and homopolymers on chemically nanopatterned substrates, it is possible to pattern non-regular device-oriented structures via the redistribution of homopolymer across the patterns. The technological implication of this hybrid top-down bottom-up approach is that the fine control of structure dimensions afforded by self-assembling block copolymer materials may be harnessed for applications such as the production of nanoelectronic devices. Exciting opportunities also exist to extend this strategy of directing the assembly of block copolymers on two-dimensional templates (chemically nanopatterned surfaces) for the fabrication of complex three-dimensional structures.
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