Thomas A. Badgwell, Ph.D., P.E.

Research Interests:

• Process Modeling
• Process Optimization
• Process Control

Education:

• B.S. (1982) Rice University
• M.S. (1990) University of Texas at Austin
• Ph.D. (1992) University of Texas at Austin

My current research is focused on the development of Model Predictive Control (MPC) algorithms for the dynamic optimization of chemical processes. State-of-the-art control MPC algorithms optimize plant behavior through the use of an explicit process model, derived from a combination of plant tests and physical conservation laws. Control system performance is closely related to model accuracy, sometimes leading to unstable closed-loop behavior if the model is especially poor. My research group has developed a new class of robust MPC algorithms that are less sensitive to model accuracy. Robustness is accomplished by incorporating knowledge of model uncertainty directly into the problem formulation. This can be done through the use of cost function constraints that prevent unstable behavior for a range of possible plant dynamics.

My past research included modeling and optimization of reactors that deposit thin films of diamond and poly-crystalline silicon.

Publications

1. Qin, S.J., and T.A. Badgwell, “A Survey of Industrial Model Predictive Control Technology,” Control Engineering Practice, 11/7, 733-764, (2003).
2. Muske, K.R., and T.A. Badgwell, “Disturbance Modeling for Offset-Free Linear Model Predictive Control,” Journal of Process Control, 12/5, 617-632, (2002).
3. Badgwell, T.A., and S.J. Qin, “Review of Nonlinear Model Predictive Control Applications,” in Non-linear Predictive Control: Theory and Practice, B. Kouvaritakis and M. Cannon eds., IEE publishing (2001).
4. Ralhan, S., and T.A. Badgwell, "Robust Model Predictive Control for Integrating Linear Systems with Bounded Parameters," Ind. Eng. Chem. Res., 39/8, 2981-2991, (2000).
5. Ralhan, S., and T.A. Badgwell, "Robust Control of Stable Linear Systems with Continuous Uncertainty," Comp. Chem. Eng., 24/11, 2533-2544, (2000).
6. Kassmann, D.E., T.A. Badgwell, and Robert B. Hawkins, "A Robust Steady-State Target Calculation for Model Predictive Control," AIChE J., 46/5, 1007-1024, (2000).
7. Joe, R., Badgwell, T.A., and R.H. Hauge, "Atomic Carbon Insertion as a Low-Substrate-Temperature Growth Mechanism in Diamond CVD," Diamond and Related Materials, 7, 1364-1374 (1998).
8. Meadows, E.S., and T.A. Badgwell, "Feedback Through Steady-State Target Optimization for Nonlinear Model Predictive Control," Journal of Vibration and Control, 4/1, 61-74, (1998).
9. T.A. Badgwell, "Robust Stability Conditions for SISO Model Predictive Control Algorithms," Automatica, 33/7, 1357-1361, (1997).
10. T.A. Badgwell, "Robust Model Predictive Control of Stable Linear Systems," Int. J. Control, 68/4, 797-818, (1997).
11. Kassmann, D.E., and T.A. Badgwell, "Analysis of Process Modifications for Efficient Diamond Chemical Vapor Deposition," Diamond and Related Materials, 5/9, 895-906, (1996).
12. Kassmann, D.E., and T.A. Badgwell, "Modeling Diamond Chemical Vapor Deposition in a Rotating Disk Reactor," Diamond and Related Materials, 5/3-5, 221-225, (1996).
13. Badgwell, T.A., Breedijk T., Bushman, S.G., Butler, S.W., Chatterjee, S., Edgar, T.F., Toprac, A.J., and I. Trachtenberg, "Modeling and Control of Microelectronics Materials Processing," Computers and Chemical Engineering, 19, 1-41, (1995).
14. Badgwell, T.A., Edgar, T.F., and I. Trachtenberg, "Modeling the Wafer Temperature Profile in a Multiwafer LPCVD Furnace," Journal of The Electrochemical Society, 141, 161, (1994).
15. Badgwell, T.A., Edgar, T.F., Trachtenberg, I., Yetter, G., Elliott, J.K., and R.L. Anderson, "In-situ Measurement of Wafer Temperatures in a Low Pressure Chemical Vapor Deposition Furnace," IEEE Transactions on Semiconductor Manufacturing, 6, 65, (1993).
16. Badgwell, T.A., Edgar, T.F., and I. Trachtenberg, "Modeling and Scale-up of Multiwafer LPCVD Reactors," AIChE Journal, 38, 926, (1992).
17. Badgwell, T.A., Edgar, T.F., Trachtenberg, I., and J.K. Elliott, "Experimental Verification of a Fundamental Model for Multiwafer Low Pressure Chemical Vapor Deposition of Polysilicon," Journal of The Electrochemical Society, 139, 524, (1992).
    
    
    

Modified 9.10.08

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